Abstract: This dissertation describes an alternative
technique of extreme ultraviolet (EUV)
lithography. A compact nanofabrication system that
combines Talbot lithography and a table top
extreme ultraviolet laser illumination is
presented. The lithographic method based on the
Talbot effect provides a robust and simple
experimental setup that is capable to print
arbitrary periodic structures over millimeter
square areas free of defects. Test structures were
printed and metalized by ion beam etching system
which was rebuilt and calibrated as part of this
work. The results demonstrate that a complete
coherent extreme ultraviolet lithographic process
based on a table top system has the capability to
fabricate functional periodic metallic
nanostructures. Preliminary results and prospects
for future work is also presented at the end of
this dissertation.

Adviser: Mario Marconi
Co-Adviser: Carmen Menoni
Non-ECE Member: Mingzhong Wu, Physics
Member 3: N/A
Addional Members: N/A

Publications:
Lukasz Urbanski, Wei Li, Jorge J. Rocca, Carmen S. Menoni, Mario C. Marconi et al. 'Defect tolerant extreme ultraviolet lithography technique', J. Vac. Sci. Technol. B 30, 06F502 (2012);

Program of Study:
ECE 404
ECE 441
ECE 505
ECE 506
ECE 507
ECE 650
MATH 531
ECE 699