Graduate Exam Abstract

Lukasz Urbanski

Ph.D. Final
September 27, 2012, 11 a.m. - 3 p.m.
ERC Computer Classroom

Abstract: The natural pursuit of the Moore's law forces the semiconductor industry to transfer to ever-shorter wavelengths of illumination in projection lithography printing. The EUV light is perhaps the most viable candidate for the next generation integrated circuits printing. However, it encounters many challenges associated with the very nature of the EUV light. Many novel techniques and materials are being applied at the same time in the process of printing. As such the process itself is far from being reliable. Thus the solutions are being sought among the alternative methods of printing in the nano-scale that would aid to temporarily overpass the resolution gap. This presentation treats about several alternative techniques of nanofabrication with the EUV light.

Adviser: Mario C. Marconi
Co-Adviser: n/a
Non-ECE Member: Vakhtang Putkaradze
Member 3: Randy A. Bartels
Addional Members: Carmen C. Menoni

Defect tolerant extreme ultraviolet nanoscale printing, L. Urbanski, A. Isoyan, A. Stein, J.J. Rocca, C.S. Menoni and M.C. Marconi, Opt. Lett. 37, 3633 (2012).
Spectral linewidth of a Ne-like Ar capillary discharge soft-x-ray laser and its dependence on amplification beyond gain saturation, L. Urbanski, M. C. Marconi, L. M. Meng, M. Berrill, O. Guilbaud, A. Klisnick, and J. J. Rocca, Phys. Rev. A, 85, 033837 (2012).
Defect Tolerant Extreme Ultraviolet Lithography Technique, L. Urbanski, W.Li, A. Isoyan, A. Stein, J.J. Rocca, C.S. Menoni and M.C. Marconi, J.Vac. Sci. Technol. B, (in press) Analysis of a scheme for de-magnified talbot lithography, L. Urbanski, M. C. Marconi, A. Isoyan, A. Stein, C. S. Menoni, and J. J. Rocca, J. Vac. Sci. Technol. B, 29, 06F504 (2011).
Talbot lithography: Self-imaging of complex structures, A. Isoyan, F. Jiang, Y. C. Cheng, F. Cerrina, P. Wachulak, L. Urbanski, J. Rocca, C. Menoni, and M. Marconi, J. Vac. Sci. Technol. B, 27, 2931 (2009).

Program of Study:
ECE 650