Abstract: The natural pursuit of the Moore's law forces the semiconductor industry to transfer to ever-shorter wavelengths of illumination in projection lithography printing. The EUV light is perhaps the most viable candidate for the next generation integrated circuits printing. However, it encounters many challenges associated with the very nature of the EUV light. Many novel techniques and materials are being applied at the same time in the process of printing. As such the process itself is far from being reliable. Thus the solutions are being sought among the alternative methods of printing in the nano-scale that would aid to temporarily overpass the resolution gap. This presentation treats about several alternative techniques of nanofabrication with the EUV light.
Adviser: Mario C. Marconi Co-Adviser: n/a Non-ECE Member: Vakhtang Putkaradze Member 3: Randy A. Bartels Addional Members: Carmen C. Menoni
Publications: Defect tolerant extreme ultraviolet nanoscale printing, L. Urbanski, A. Isoyan, A. Stein, J.J. Rocca, C.S. Menoni and M.C. Marconi, Opt. Lett. 37, 3633 (2012).
Spectral linewidth of a Ne-like Ar capillary discharge soft-x-ray laser and its dependence on amplification beyond gain saturation, L. Urbanski, M. C. Marconi, L. M. Meng, M. Berrill, O. Guilbaud, A. Klisnick, and J. J. Rocca, Phys. Rev. A, 85, 033837 (2012).
Defect Tolerant Extreme Ultraviolet Lithography Technique, L. Urbanski, W.Li, A. Isoyan, A. Stein, J.J. Rocca, C.S. Menoni and M.C. Marconi, J.Vac. Sci. Technol. B, (in press)
Analysis of a scheme for de-magnified talbot lithography, L. Urbanski, M. C. Marconi, A. Isoyan, A. Stein, C. S. Menoni, and J. J. Rocca, J. Vac. Sci. Technol. B, 29, 06F504 (2011).
Talbot lithography: Self-imaging of complex structures, A. Isoyan, F. Jiang, Y. C. Cheng, F. Cerrina, P. Wachulak, L. Urbanski, J. Rocca, C. Menoni, and M. Marconi, J. Vac. Sci. Technol. B, 27, 2931 (2009).
Program of Study: CHEM577 ECE504 ECE505 ECE506 MATH531 ECE 650 ECE574 ECE546