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Abstract


Sponsor: National Science Foundation (NSF)

Title: Engineering Research Center for Extreme Ultraviolet Science and Technology

Investigator: Rocca

Abstract:
The Engineering Research Center for Extreme Ultraviolet Science and Technology at Colorado State University (CSU) in partnership with the University of Colorado (CU), the University of California, Berkeley, and the Center for X-Ray Optics, Lawrence Berkeley Laboratory. The P.I. and Center Director is Dr. Jorge Rocca, Professor of Electrical and Computer Engineering at CSU. The vision of the ERC is to inexpensively harness the extreme ultraviolet (EUV), soft x-ray range of electromagnetic radiation to image and measure small features, particularly in the metrology of VLSI masks and the microscopy of biological specimens. These functions currently are performed using synchrotron radiation sources. EUV wavelengths can image nanoscale features, making the deliverables of this ERC useful in manipulating and producing nanoscale objects. The ERC is based on a partnership with microelectronics firms and will prepare a diverse workforce of physicists and electrical engineers needed to advance and implement EUV and nanoscale science and technology.