ECE Faculty Funded Research

Collins Photo

Dr. George J Collins


Funded Research

  • Acquisition of a Liquid Cesium Ion Source (National Science Foundation (NSF))
  • Ambient Atomic Oxygen Effects on Epitaxial High Tc Superconducting Films Deposit... (AMI-Advanced Materials Institute)
  • Atomic Hydrogen Assisted MOCVD of GaAs on Si and SiO2 (State of Colorado-Div. of Youth Services)
  • Beam Assisted Fabrication of III - V Monolithic Devices (DoD-USAF-Air Force)
  • Beam Assisted Hermetic Coatings for Fluoride Glasses (DoD-NAVY-Naval Research Lab (NRL))
  • Cylindrical Magnetron Plasma Modeling & Associated Laser Rate Equations (National Science Foundation (NSF))
  • Electrical Measurements of Circuit Interconnection Networks Using Microplasma-Based Contacts (IMAPS Sidney J. Stein Educational Fdn)
  • Electrical Power Supply Activities (Advanced Energy Industries, Inc.)
  • Electron Beam Curing of Polymer Resists (National Science Foundation (NSF))
  • Electron Beam Curing of Spin & Planarization of Spin-on Glass (National Science Foundation (NSF))
  • Electron Beam Curing of Spin-on Glass (National Science Foundation (NSF))
  • Employing an External Wire Coil to Inductively Excite a Laser Discharge Tube (Spectron/Surgilase Products)
  • Engineering Research Equipment Grant (National Science Foundation (NSF))
  • Exploring Electron Beam Assisted ALE & of P-type Conductivity Control (National Science Foundation (NSF))
  • GaAs in Silicon & GaAs Islands on Sili- con Seedholes Using Remote H2-Plasma Assisted... (National Science Foundation (NSF))
  • H2 Afterglow Plasma MOCVD for Low Temp- erature Heteroepitaxy Over Wide Area Substrates (DOE-SERI-Solar Energy Research Institute)
  • Hermetic Coatings for Fluoride Fibers (DoD-NAVY-Naval Research Lab (NRL))
  • Higher Fidelity Etch Profiles & Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch (National Science Foundation (NSF))
  • Hydrogen Assisted Fabrication of Opto- electronic Devices Utilizing GaAs on Si & GaAs... (National Science Foundation (NSF))
  • Intensive Study Fellowship (National Science Foundation (NSF))
  • Japanese Language Fellowship (National Science Foundation (NSF))
  • Laser Ablation of Microwave Superconducting Films (Ball Aerospace Corporation)
  • Laser Wavelength & Pulse Width Effects on Epitaxial High Tc Superconducting Films Depos.. (AMI-Advanced Materials Institute)
  • Low Temperature Photon and Electron Beam Assisted Deposition (National Science Foundation (NSF))
  • Magnetron Excited Ultraviolet Ion Lasers (National Science Foundation (NSF))
  • Measurement of Line Source Electron Beam Discharge Fundamental Properties (Ionic Systems Corporation)
  • New Excitation Sources for Ultra High Quality Amorphous Semi Conducting Filters (NEDO(New Energy/Indus. Tech. Dev. Org.))
  • Optoelectronics Lasers (University of Colorado)
  • Phased Rf Excitation of Plasmas - Industry Match for NSF Grant (Advanced Energy Industries, Inc.)
  • Photon & Reactive Gas Assisted Hetero- epitaxy of III-V & II-VI Optoelectronic Films (National Science Foundation (NSF))
  • Plasma & Beam Induced Chemistry for Materials Processing (National Science Foundation (NSF))
  • Plasma Assisted MOCVD of High Purity ZBLAN Fluoride Glass Films (DoD-NAVY-Naval Research Lab (NRL))
  • Plasma Damage for Submicron Manufacturing (Hewlett-Packard)
  • Polymer Processing/Research Experiences for Undergraduates (National Science Foundation (NSF))
  • Quantifying Plasma Generated Particle & Charge Build Up Damage in Submicron Manufacturing (National Science Foundation (NSF))
  • Quantifying the Role of 121.5nm Photons on the GaAs Growth Rate Activation Energy (National Science Foundation (NSF))
  • Research Experience for Undergraduates Uniform Grain Size Polysilicon Plasma Processing.. (National Science Foundation (NSF))
  • Soft Vacuum Electron Beam (I.B.M.)
  • Sputter Deposition of Oxide Ceramic Superconducting Films on Insulating Substrates (State of Colorado-Div. of Youth Services)
  • Uniform Grain Size Polysilicon for Thin Film Transistors (National Science Foundation (NSF))
  • Uniform Grain Size Polysilicon for Thin Film Transistors - GOALI/IUCRP (National Science Foundation (NSF))
  • VUV Measurements of Fluorine Plasma for Device Damage Studies (Sematech, Inc.)