Nanoscale Science and Technology Fabrication
and Characterization Facility

Key Technology of CSU Nano-Facility

The user-based facility is based on nanopatterning, nanomachining and imaging test-beds that use the output from bright laser beams with wavelengths in the extreme ultraviolet to ‘write’ and ’see’ nanoscale features. The backbone of the test-beds is the mature 46.9 nm wavelength discharge laser technology first demonstrated at CSU. Figure 1a shows the 46.9 nm EUV laser connected to an application chamber where nanopatterning and nanomachining set ups can be accommodated. Key to the implementation of the test beds are the high average output power and high degree of coherence of the laser output. This laser developed at CSU is the world’s highest average power compact coherent EUV source presently available at this wavelength. Such compact EUV nanofabrication/characterization facility is totally unique, as nowhere else in the world are such high average power EUV lasers available.