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Cavity Ring Down Spectroscopy for Sputter Measurements

        Sputtering is the process in which an energetic bombarding particle, usually an ion accelerated by an electric field, is incident on a material and causes the ejection of atoms, ions, and/or molecules from a surface. It has many applications including thin-film deposition, etching and analytical techniques. It also plays an important role in spacecraft propulsion, since sputtering can damage the thruster and cause re-deposition on other spacecraft surfaces. We employ the cavity ring-down spectroscopy (CRDS) technique to help study sputtering characteristics.  
Ring-Down
       CRDS is a highly sensitive path-enhanced laser absorption method that is widely used for trace-species measurement in flames, plasmas and atmosphere. It is capable of doing quantitative measurements of ultra low density particles non-intrusively in real time. The basic idea of CRDS is introduce an absorbing species (i.e. the sputtered atoms) into a high finesse optical cavity formed by high-reflectivity mirrors. The laser is tuned around a specific spectral transition line of the absorber. A photo detector is placed behind the cavity to measure the laser decay single inside the cavity (ring-down signal). Under appropriate conditions, the ring-down signal decays single exponentially versus time. By comparing the laser decay constant inside the cavity with and without the absorber, the absorption and path-integrated number density can be measured.
Experimental Setup CRDS Cavity Setup
     In our laboratory, a broadly tunable optical parametric oscillator (OPO) laser system (doubled idler) is used as the light source to probe the required optical transitions. It provides a very large wavelength range (200 nm to 1200 nm) that allows us to do measurement for many different materials. The optical cavity is formed using a pair of high-reflectivity mirrors and integrated with a sputtering facility consisting of an ion beam and sputtering target within a vacuum chamber. The ring-down signals are collected behind the output mirror with a fast photomultiplier tube and passed to a custom data acquisition code which fits the signals with exponentials to extract the ring-down (1/e) times. A given measurement requires recording of the absorbance spectrum and is achieved by scanning the laser across the given absorption feature(s) and determining the ring-down time at each laser wavelength step.
Endpoint Detection Schema
     Real time in situ monitoring of the concentration of sputtered particles would provide a powerful tool for process control in ion beam etch systems, including end point monitoring. An end-point detection is demonstrated by monitoring the time dependence of Manganese concentration for a multi-layer target comprised of alternating Manganese layers in near real time.

References:  
  • V. Surla, P.J. Wilbur, J.D. Williams, M. Johnson, A.P. Yalin, "Sputter Erosion Measurements of Titanium and Molybdenum by Cavity Ring-Down Spectroscopy", Review of Scientific Instruments 75 9, pp. 3025-3030 (2004)
     
  • A.P. Yalin, V. Surla, "Velocity Measurements by Cavity Ring-Down Spectroscopy", Optics Letters 30 3219 (2005)
     
  • A.P. Yalin, V. Surla, M. Butweiller, J.D. Williams, "Detection of Sputtered Metals using Cavity Ring-Down Spectroscopy", Applied Optics 44 30, pp. 6496-6505 (2005)
     
  • V. Surla, A.P. Yalin, "Differential Sputter Yield Measurements using Cavity Ring-Down Spectroscopy", Applied Optics 46 19, pp. 3987-3994 (2007)
     
  • L. Tao, N. Yamamoto, A.P. Yalin, "Cavity Ring-Down Spectroscopy Sensor for Ion Beam Etch Monitoring and End-Point Detection of Multilayer Structures", Review of Scientific Instruments 79 115107 (2008)
       

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