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Graduate Exam Abstract


Wei Li

M.S. Final

June 26, 2013, 3:30 PM

ERC Electronic Classroom

PERIODIC METALLIC NANOSTRUCTURES FABRICATED BY COHERENT TALBOT LITHOGRAPHY IN A TABLE TOP SYSTEM


Abstract: This dissertation describes an alternative technique of extreme ultraviolet (EUV) lithography. A compact nanofabrication system that combines Talbot lithography and a table top extreme ultraviolet laser illumination is presented. The lithographic method based on the Talbot effect provides a robust and simple experimental setup that is capable to print arbitrary periodic structures over millimeter square areas free of defects. Test structures were printed and metalized by ion beam etching system which was rebuilt and calibrated as part of this work. The results demonstrate that a complete coherent extreme ultraviolet lithographic process based on a table top system has the capability to fabricate functional periodic metallic nanostructures. Preliminary results and prospects for future work is also presented at the end of this dissertation.

Adviser: Mario Marconi
Co-Adviser: Carmen Menoni
Non-ECE Member: Mingzhong Wu, Physics
Member 3: N/A
Addional Members: N/A

Publications:
Lukasz Urbanski, Wei Li, Jorge J. Rocca, Carmen S. Menoni, Mario C. Marconi et al. 'Defect tolerant extreme ultraviolet lithography technique', J. Vac. Sci. Technol. B 30, 06F502 (2012);


Program of Study:
ECE 404
ECE 441
ECE 505
ECE 506
ECE 507
ECE 650
MATH 531
ECE 699