Abstract: I present a review of selected techniques of lithography with coherent Extreme Ultraviolet (EUV) light. I describe in detail EUV lithography schemes such as Holographic Projection lithography, Generalized Talbot Imaging lithography and De-magnified Generalized Talbot Imaging lithography. I present concept of defect tolerance in Generalized Talbot Imaging lithography. A comparison of the experimental results with numerical simulation is presented for all mentioned lithography techniques.
Adviser: Mario Marconi Co-Adviser: N/A Non-ECE Member: Vakhtang Putkaradze, Mathematics Member 3: Carmen Menoni, ECE, Randy Bartels, ECE Addional Members: N/A
Publications: Urbanski, L.; Marconi, M. C.; Meng, L. M.; Berrill, M.; Guilbaud, O.; Klisnick, A.; Rocca, J. J. Phys. Rev. A 85, 033837 (2012)
Urbanski, L.; Marconi, M. C.; Isoyan, A.; Stein, A.; Menoni, C. S. & Rocca, J. J. JVST B AVS, 2011, 29, 06F504
L. Urbanski ,L. M. Meng, M. C. Marconi, M. Berril, O. Guilbaud, A. Klisnick, J. J. Rocca SPIE Proc. 2011, 8140, 81400Y,
Urbanski L, Marconi M, Stein A, Menoni C, Rocca J, "Defect Tolerant EUV Lithography Technique”. Optics Letters (manuscript in preparation)
Isoyan, A.; Jiang, F.; Cheng, Y. C.; Cerrina, F.; Wachulak, P.; Urbanski, L.; Rocca, J.; Menoni, C. & Marconi, M. JVST B, AVS, 2009, 27, 2931-2937
M. C. Marconi, P. Wachulak, L. Urbanski, C.S Menoni and J. J. Rocca, A. Isoyan, F. Jiang, Y. Cheng, F. Cerrina SPIE Proc Vol. 7271 72713O-3
Program of Study: ECE 695 ECE 546 ECE 506 ECE 505 ECE 504 MATH 531 CHEM 577 ECE 650