Graduate Exam Abstract

Lukasz Urbanski

Ph.D. Preliminary

April 6, 2012, 9.00 am

ERC Electronic Classroom

Coherent EUV lithography with Capillary Discharge Laser

Abstract: I present a review of selected techniques of lithography with coherent Extreme Ultraviolet (EUV) light. I describe in detail EUV lithography schemes such as Holographic Projection lithography, Generalized Talbot Imaging lithography and De-magnified Generalized Talbot Imaging lithography. I present concept of defect tolerance in Generalized Talbot Imaging lithography. A comparison of the experimental results with numerical simulation is presented for all mentioned lithography techniques.

Adviser: Mario Marconi
Co-Adviser: N/A
Non-ECE Member: Vakhtang Putkaradze, Mathematics
Member 3: Carmen Menoni, ECE, Randy Bartels, ECE
Addional Members: N/A

Urbanski, L.; Marconi, M. C.; Meng, L. M.; Berrill, M.; Guilbaud, O.; Klisnick, A.; Rocca, J. J. Phys. Rev. A 85, 033837 (2012)
Urbanski, L.; Marconi, M. C.; Isoyan, A.; Stein, A.; Menoni, C. S. & Rocca, J. J. JVST B AVS, 2011, 29, 06F504
L. Urbanski ,L. M. Meng, M. C. Marconi, M. Berril, O. Guilbaud, A. Klisnick, J. J. Rocca SPIE Proc. 2011, 8140, 81400Y,
Urbanski L, Marconi M, Stein A, Menoni C, Rocca J, "Defect Tolerant EUV Lithography Technique". Optics Letters (manuscript in preparation)
Isoyan, A.; Jiang, F.; Cheng, Y. C.; Cerrina, F.; Wachulak, P.; Urbanski, L.; Rocca, J.; Menoni, C. & Marconi, M. JVST B, AVS, 2009, 27, 2931-2937
M. C. Marconi, P. Wachulak, L. Urbanski, C.S Menoni and J. J. Rocca, A. Isoyan, F. Jiang, Y. Cheng, F. Cerrina SPIE Proc Vol. 7271 72713O-3

Program of Study:
ECE 695
ECE 546
ECE 506
ECE 505
ECE 504
MATH 531
CHEM 577
ECE 650