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Graduate Exam Abstract


Fernando Brizuela

Ph.D. Final

July 23, 2010, 1 pm

Engr B105

TABLE-TOP, FULL-FIELD ACTINIC MICROSCOPE FOR EXTREME ULTRAVIOLET LITHOGRAPHY MASK CHARACTERIZATION


Abstract: Advancement in extreme ultraviolet lithography (EUVL) requires the development of defect inspection tools capable of imaging printable amplitude and phase defects on EUV reticles on- site. The masks’ resonant-reflective multilayer coatings and wavelength-specific response call for at-wavelength inspection. I will present the demonstration of a table-top zone plate microscope that captures broad area images of periodic objects with a spatial resolution of 55 nm, using the same numerical aperture and illumination angle of a 4× EUV stepper. This microscope combines the output of a 13.2 nm wavelength table-top Ni-like Cd laser with state-for-art Fresnel zone plates to acquire high quality images with exposure times of less than 90 sec. These results open the path for the realization of convenient stand-alone metrology systems for on-site evaluation of EUVL masks.

Adviser: Carmen Menoni
Co-Adviser: Jorge Rocca
Non-ECE Member: Stephen Lundeen, Physics
Member 3: Mario Marconi, ECE
Addional Members: N/A

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