John Mahan is a professor of electrical engineering at Colorado State University. He is currently investigating metal silicide thin films -- their growth by physical vapor deposition, and their physical properties. The intended practical application of the research is to develop semiconducting silicide thin films for integrated optoelectronics on silicon chips. He is a student of the broader subject of the fundamental physical science of thin films, offering graduate courses in Physical Vapor Deposition, and Thin Film Growth.
After completing the doctorate, Dr. Mahan investigated photovoltaic devices as a Research Associate at MIT. He has also spent a sabbatical year at the Center for Research on the Mechanisms of Crystal Growth in Marseille, France. He enjoys the French language, backpacking, fly fishing, old Lionel trains, fine woodworking, and the martial arts.