Defense Presentation

Michael Grisham

M.S. Final
June 22, 2009, 8:30 am
ERC B301
"APPLICATIONS OF A EXTREME ULTRAVIOLET CAPILLARY DISCHARGE LASER"
Abstract:  Compact high repetition rate Extreme Ultraviolet (EUV) lasers operating in the gain-saturated regime have opened the opportunity to conduct experiments with intense coherent EUV light on a table-top. This thesis discusses the use of a capillary discharge Ne-like Ar laser operating at 46.9 nm wavelength in the ablation of materials, nanopatterning, and high resolution imaging. Unlike visible light, EUV light has a very shallow penetration in practically all materials. Also, its high photon energy allows single photons to break bonds in materials such as common polymers. These features result in ablation mechanisms that are different from those associated with lasers that operate at optical wavelenghts. This thesis studies EUV laser induced damage on three common organic polymers, metals, and Sc/Si multilayer coatings. As an application of the interactions of coherent EUV light with materials we have demonstrated the maskless printing of gratings with lines as small as 55 nm using interferometric lithography. The short wavelength of the EUV lasers also offers the opportunity for improving the spatial resolution in imaging systems. This thesis describes the first implementantion of an EUV microscope capable of operating in transmission and reflection modes. The microscope combines a reflective optics condenser and a diffractive zone plate objective with the bright output from the 46.9 nm wavelength laser. Images were obtained with a spatial resolution of 120 – 150 nm. These results enabled subsequent experiments that have demonstrated single- shot imaging of nanostructures with 54 nm spatial resolution. Michael Eric Grisham Electrical and Computer Engineering Department Colorado State University Fort Collins, CO 80523 Summer 2009

Adviser: Jorge Rocca
Co-adviser: none
Non-ECE member: Elliot Bernstein Chemistry
Member3: Carmen Menoni Electrical Engineering
Member4: none
Additional member: none

Publications to be Reviewed:
1. Y.P. Pershyn, E.N. Zubarev, D.L. Voronov, V.A. Sevryukova,V.V. Kondratenko, G. Vaschenko, M. Grisham, C.S. Menoni, J.J. Rocca, I.A. Artioukov, Y.A Uspenskii, and A.V. Vinogradov, “Mechanisms of radiation damage to Sc/Si multilayer mirrors under EUV laser irradiation,” J. Phys. D: Appl. Phys. 42, 125407, (2009).
2. T. Popmintchev, M. Chen, O. Cohen, M. Grisham, J. Rocca, M. Murnane, and H. Kapteyn, "Extended phase matching of high harmonics driven by mid-infrared light," Opt. Lett. 33, 2128-2130 (2008).
3. P. Wachulak, M. Grisham, S. Heinbuch, D. Martz, W. Rockward, D. Hill, J.J. Rocca, C.S. Menoni, E. Anderson, and M. Marconi, “Interferometric lithography with an amplitude division interferometer and a desktop extreme ultraviolet laser,” J. Opt. Soc. Am. B 25, B104, (2008).
4. B.A. Reagan, T. Popmintchev, M.E. Grisham, D.M. Gaudiosi, M. Berrill, O. Cohen, B.C. Walker, M.M. Murnane, J.J. Rocca, and H.C. Kapteyn, “Enhanced High Harmonic Generation from Xe, Kr, and Ar in a Capillary Discharge,” Physical Review A, 76, 013816, (2007).
5. D.M. Gaudiosi, B. Reagan, T. Popmintchev, M. Grisham, M. Berrill, O. Cohen, B.C. Walker, M.M. Murnane, H.C. Kapteyn, and J.J. Rocca, “High-Order Harmonic Generation from Ions in a Capillary Discharge,” Physical Review Letters 96, 203001, (2006).
6. M.G. Capeluto, G. Vaschenko, M. Grisham, M.C. Marconi, S. Ludueña, L. Pietrasanta, Y. Lu, B. Parkinson, C.S. Menoni, and J.J. Rocca,“Nanopatterning With Interferometric Lithography Using a Compact ? = 46.9-nm Laser,” IEEE Transactions on Nanotechnology 5, 3, (2006).
7. S. Heinbuch, M. Grisham, D. Martz, and J.J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Optics Express 13, 4050, (2005).
8. F. Brizuela, G. Vaschenko, C. Brewer, M. Grisham, C.S. Menoni, M.C. Marconi, J.J. Rocca, W. Chao, J.A. Liddle, E.H. Anderson, D.T. Attwood, A.V. Vinogradov, I.A. Artioukov, Y.P. Pershyn, and V.V. Kondratenko, “Reflection mode imaging with nanoscale resolution using a compactextreme ultraviolet laser,” Optics Express 13, 3983, (2005).
9. G. Vaschenko, F. Brizuela, C. Brewer, M. Grisham, H. Mancini, C.S. Menoni, M.C. Marconi, J.J. Rocca, W. Chao, J.A. Liddle, E.H. Anderson, D.T. Attwood, A.V. Vinogradov, I.A. Artioukov, Y.P. Pershyn, and V.V. Kondratenko, “Nanoimaging with a compact extreme-ultraviolet laser,” Optics Letters 30, 2095, (2005).
10. L. Juha, M. Bittner, D. Chvostová, J. Krása, M. Kozlová, M. Pfeife


Program of Study:
EE 574 Optical Materials and Devices
EE 650 Extreme Ultraviolet/SoftX-Rays
EE 421 Telecommunications I
EE 422 Telecommunications II
EE 580 Physical Optics
EE 581 Ultrafast Optics
EE 777 X-ray Lasers